Pico Mask

Masked random sample and hold

Erica Synths · 3 HP · 3U

Panel · 15.2 × 128.5 mm

Description

An advanced random CV module in 3 HP from Erica Synths' Pico series, retired: it samples and holds random CVs within a mask, the area between two incoming CVs, for controlled randomness; also a CV processor, waveshaper or bitcrusher.

Key features

  • CV1 and CV2 define the mask
  • MIDDLE sets the mask's middle point, WIDTH the range of the output CVs
  • NORM / INV: CVs picked by the WIDTH setting, or opposite to it, on the mask's edges
  • NORM / DISTR: CVs picked evenly, or 75 % round the middle point
  • TR IN triggers the S&H; lamps for the trigger and the output
  • CVs -5 V to +5 V in and out
  • +12 mA, -6 mA, 35 mm deep

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