Pico Mask
Masked random sample and hold
Panel · 15.2 × 128.5 mm
Description
An advanced random CV module in 3 HP from Erica Synths' Pico series, retired: it samples and holds random CVs within a mask, the area between two incoming CVs, for controlled randomness; also a CV processor, waveshaper or bitcrusher.
Key features
- CV1 and CV2 define the mask
- MIDDLE sets the mask's middle point, WIDTH the range of the output CVs
- NORM / INV: CVs picked by the WIDTH setting, or opposite to it, on the mask's edges
- NORM / DISTR: CVs picked evenly, or 75 % round the middle point
- TR IN triggers the S&H; lamps for the trigger and the output
- CVs -5 V to +5 V in and out
- +12 mA, -6 mA, 35 mm deep